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SiC高溫退火爐
所屬分類:
立式爐管設備
半導體芯片設備
SiC高溫退火爐
概要:
? 適用領域:化合物半導體 Relevant Industries: Compound Semiconductors ?適用材料:SiC Suitable for Processing: Silicon Carbide (SiC) ?晶圓尺寸:8/6英寸 Wafer Size: 8/6 inch ?適用工藝:高溫退火(Annealing) Applicable Processes: High-Temperature Annealing Applicable process: Annealing of SiC and GaN wafers
關鍵詞:
SiC高溫退火爐
SiC高溫退火爐
產品應用/Product Applications
♦ 適用領域:化合物半導體 Relevant Industries: Compound Semiconductors
♦適用材料:SiC Suitable for Processing: Silicon Carbide (SiC)
♦晶圓尺寸:8/6英寸 Wafer Size: 8/6 inch
♦適用工藝:高溫退火(Annealing) Applicable Processes: High-Temperature Annealing Applicable process: Annealing of SiC and GaN wafers
技術指標 Technical Parameters:
♦ 制程溫度范圍:800°C-1600°C Process Temperature Range: 800°C-1600°C
♦ 批次片數(shù): 50片 Batch Capacity: 50 pcs
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