山東力冠微電子裝備

產(chǎn)品展示


LPCVD設(shè)備

適用領(lǐng)域:集成電路、先進封裝、化合物半導(dǎo)體 Relevant Industries: Integrated Circuits, Advanced Packaging, Compound Semiconductors 適用材料: ?Si、SiC、GaN Suitable for Processing: Silicon (Si), Silicon Carbide (SiC), Gallium Nitride (GaN) 晶圓尺寸:12/8/6英寸 Wafer Size: 8/6 inch 適用工藝:氮化硅(SiN)、多晶硅(Poly-Si/U-Poly/D-Poly)、 二氧化硅(TEOS)、HTO等 Applicable Processes: Silicon Nitride (SiN) Deposition, Polysilicon(Poly-Si / U-Poly /D-Poly) Deposition, Silicon Dioxide (TEOS) Deposition, HTO, etc.

< 1 > 前往